Tutorial 1: Fundamentals and Trends of Plasma Surface Processing
The tutorial will cover the fundamentals of selected modern plasma processes and their applications in research and industry. Among other topics, High-Power Impulse Magnetron Sputtering (HiPIMS) will be a major subject. The lectures will be given by internationally recognized senior scientists.
The tutorial will be organized by the German PISE Group (PLASMA GERMANY) in cooperation with EFDS, and chaired by Christian Oehr, Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik (IGB), Stuttgart (GER).
This tutorial (PDF, 10KB) will be held on Sunday, September 12, 2010, 9:00 - 18:00, Room Zugspitze.
|
09:00-10:30 |
Modelling of technical Plasmas |
|
10:30-10:40 |
Break |
|
10:40-12:10 |
Nanostructures by Ion Bombardment |
|
12:10-13:00 |
Lunch |
|
13:00-14:30 |
HiPIMS - from plasma physics to industrial application |
|
14:30-14:40 |
Break |
|
14:40-16:10 |
Dielectric barrier discharges for surface Treatment at ambient pressure |
|
16:10-16:30 |
Coffee Break |
|
16:30-18:00 |
Plasma Treatment of Polymers and Plasma Polymerization |

