Program
Status as Feb 05, 2012Thursday, September 16, 2010Poster
Session, 15:15 - 16:25
Poster - Plasma characterization |
|
| PO4001 |
Influence of N2 and Ar on Charge-state-resolved ion energy distributions of arc plasma from Ti3SiC2 cathodes Anders Eriksson1, Stanislav Mráz2, Jochen M. Schneider2, Johanna Rosén3 1Linköping University, Linköping, Germany, 2Materials Chemistry, RWTH Aachen University, Aachen, Germany, 3IFM, Linköping University, Linköping, Sweden |
| PO4002 |
Generation of positive and negative ions in magnetron discharge during reactive sputtering of alumina. Petr Pokorny1, Jiri Bulir1, Jano Lancok1, Jindrich Musil1, Michal Novotny1 1Institute of Physics ASCR, v.v.i., Praha 8, Czech Republic |
| PO4003 |
Characterization by mass spectrometry of microwave sources for atomic species production Cédric Noël1, Thierry Belmonte1, Gérard Henrion1 1Institut Jean Lamour, Nancy, France |
| PO4004 |
Experimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma Dmitry Mansfeld1, Alexander Vodopyanov1, Sergei Golubev1, Petr Sennikov1 1Institute of applied physics, Nizhny Novgorod, Russian Federation |
| PO4005 |
Retarding field analysis of the time averaged and time resolved ion energy distribution at a biased electrode in a plasma discharge. David Gahan1, Borislav Dolinaj1, Donal O'Sullivan1, Mike Hopkins1 1Impedans Ltd., Dublin, Ireland |
| PO4006 |
On the determination of energy fluxes in plasma processing by calorimetric probes Holger Kersten1, Sven Bornholdt2, Marc Stahl2, Matthias Wolter2 1Universiity of Kiel, IEAP, Kiel, Germany, 2University of Kiel, IEAP, Kiel, Germany |
| PO4007 |
Energy influx measurements with the active thermal probe in several plasma-technological processes Ruben Wiese1, Holger Kersten2 1INP Greifswald, Greifswald, Germany, 2Universität Kiel, Kiel, Germany |
| PO4008 |
Spatially resolved Langmuir probe measurements of a magnetically enhanced hollow cathode arc plasma Burkhard Zimmermann1, Fred Fietzke1, Wolfhard Möller2 1Fraunhofer Institute FEP, Dresden, Germany, 2Institute of Ion Beam Physics and Materials Research, FZD, Dresden, Germany |
| PO4009 |
Langmuir probe diagnostics and deposition modelling of a carbon-tungsten thermionic vacuum arc system Cristian P. LUNGU1, Aurelian MARCU1, Constantin GRIGORIU1, Ionut JEPU1, Corneliu POROSNICU1, Vasile TIRON2, Gheorghe POPA2 1NILPRP, Bucharest, Romania, 2Al I Cuza University, Iasi, Iasi, Romania |
| PO4010 |
Automated system for DC and RF plasma parameter determination by guard double electric probes Rosendo Pena-Eguiluz1, Israel Alejandro Rojas-Olmedo2, Regulo Lopez-Callejas3, Anibal de la Piedad-Beneitez2, Raul Valencia-Alvarado3, Antonio Mercado-Cabrera3, Samuel Roberto Barocio Delgado3, Arturo Eduardo Muñoz-Castro3, Benjamin Gonzalo Rodriguez Mendez3 1Inst. Nac. de Investigaciones Nucleares, ocoyoacac, Mexico, Mexico, 2Instituto Tecnologico de Toluca, Metepec, Edo de Mexico, Mexico, 3Instituto Nacional de Investigaciones Nucleares, Ocoyoacac, Mexico, Mexico |
| PO4011 |
OES study of PEALD process in low temperature TiO2 film growth Sanna Lehti1, David Cameron1, Tommi Kääriäinen1 1Lappeenranta University of Technology, Mikkeli, Finland |
| PO4012 |
OES monitoring of combined deposition of C/Al layers by PECVD/Magnetron Sputtering techniques Tomy Acsente1, Ionita Eusebiu Rosini1, Cristian Stancu1, Ionita Maria Daniela1, Dinescu Gheorghe1 1National Institute for Laser, Plasma and Radiation Physics, Bucharest - Mgurele, Romania |
| PO4013 |
Optical emission spectroscopy of pulsed magnetron sputtering plasma Mariusz ozimek1, Jan Ziaja1 1Wrocław University of Technology, Wrocław, Poland |
| PO4014 |
Time and space-resolved detection of NH and NH2-Radicals in a RF-driven microdischarge via planar laser induced fluorescence and pulsed cavity ring-down spectroscopy Andreas Schenk1, Martin Visser1, Eduard Bossauer1, Karl-Heinz Gericke1 1Institut für Physikalische Chemie, Braunschweig, Germany |
| PO4015 |
Characterisation of the plasma plume of an IAD plasma source by means of optical emission spectroscopy Jens Harhausen1, Ingo Meyenburg1, Andreas Ohl1, Rüdiger Foest1 1INP-Greifswald e.V., Greifswald, Germany |
| PO4016 |
Plasma characterization of RF magnetron sputtering of silver in Ne, Ar, Kr and Xe discharges Michal Novotny1, Jiri Bulir1, Petr Pokorny1, Jan Lancok1 1Institute of Physics ASCR, Praha 8, Czech Republic |
| PO4017 |
In-Line Analysis of DBD Plasma at Atmospheric Pressure while modifying Polymer Foil Surfaces Sandra Günther1, Nico Teuscher1, Renate Hänsel2, Andreas Kiesow1, Andreas Heilmann1 1Fraunhofer IWM, Halle, Germany, 2Research Institute of Leather and Plastic Sheeting, Freiberg, Germany |
| PO4018 |
Plasma temperature and surface studies of argon-hydrogen containing low-temperature dumbbell form light sources Atis Skudra1, Zanda Gavare1, Natalia Zorina1, Madara Zinge1 1Inst. of Atomic Physics and Spectroscopy, Riga, Latvia |
| PO4019 |
Plasma diagnostic on arc evaporation processes and influence of arc source design. Siegfried Krassnitzer1, Juerg Hagmann1, Helmut Rudigier1 1OC Oerlikon Balzers AG, Balzers, Liechtenstein |
| PO4020 |
Optimisation of the atomic nitrogen production in the hollow cathode arc discharge Achim Lunk1, Igor Vinogradov2 1Institut for Plasma Research/TGZ PA, Stuttgart, Germany, 2Institute for Plasma Research, Stuttgart, Germany |
| PO4021 |
Gas temperature measurement and flow dynamic simulation of low temperature atmospheric pressure plasma jet. Abdollah Sarani1, Anton Yu Nikiforov2, Christophe Leys2 1Department of Applied Physics, Gent Univ, Gent, Belgium, 2Ghent University, Department of Applied Physics, Gent, Belgium |
| PO4022 |
A combined sensor for the diagnostics of plasma und film properties in magnetron sputtering processes Thomas Welzel1, Klaus Ellmer1, Karsten Harbauer1 1Helmholtz-Zentrum Berlin, Berlin, Germany |
| PO4023 |
New Concepts of Process Control for Sputtering and magPECVD of Inorganic and Hybrid Coatings Daniel Glöß1, Hagen Bartzsch2, Kerstin Täschner2, Peter Frach2, Eberhard Schultheiss2 1Fraunhofer FEP, Dresden, Germany, 2Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden, Germany |
| PO4024 |
Development of a sensor platform for control and optimization of industrial plasma processes Volker Sittinger1, Oliver Werner1, Berthold Kühnert1, Szyszka Bernd1, Günter Bräuer1, Ruben Wiese2, Nino Voss2 1Fraunhofer IST, Braunschweig, Germany, 2INP Greifswald, Greifswald, Germany |
Poster - Physical Vapour Deposition |
|
| PO4025 |
Managing Arcs in Large Area Sputtering Applications Uwe Krause1, Dan Carter2 1Advanced Energy Industries GmbH, Filderstadt, Germany, 2Advanced Energy Industries Inc, Fort Collins, United States |
| PO4026 |
Deposition of Large Area Multilayer Coatings for High End Optics Dirk Rost1, Michael Zeuner1, Andreas Seifert1, Matthias Nestler1, Stefan Braun2, Andreas Leson2, Peter Gawlitza2, Maik Menzel2 1Roth&Rau MicroSystems GmbH, Hohenstein-Ernstthal, Germany, 2IWS Dresden, Dresden, Germany |
| PO4027 |
Alpha PVD deposition systems (Eifeler/Vacotec) as a basis for research and industry Hynek Hrubý1, Milan Ruzicka1, Marcus Lartz1, Susanne Meyer1, Jürgen Anklam2 1Eifeler Werkzeuge GmbH, Düsseldorf, Germany, 2VACOTEC S.A., La Chaux-de-Fonds, Germany |
| PO4028 |
Deposition of complex materials using powder targets Francis Boydens1, Stijn Mahieu1, Diederik Depla1 1Ghent University, Gent, Belgium |
| PO4029 |
Analysis of the behaviour of the reactive species in reactive magnetron sputtering of oxides Wouter Leroy1, Stijn Mahieu1, Rosita Persoons2, Diederik Depla1 1Ghent University, Gent, Belgium, 2VITO, Mol, Belgium |
| PO4030 |
Suppressed hysteresis behaviour of Ti sputtering in acetylene gas Petr Vasina1, Tereza Schmidtova1, Marek Eliás1 1Masaryk University, Brno, Czech Republic |
| PO4031 |
Suppression of arcing in DC pulse reactive magnetron sputtering Michal Meissner1, Pavel Baroch1, Jindrich Musil1 1University of West Bohemia, Plzen, Czech Republic |
| PO4032 |
Influence of the oxygen flow rate and substrate temperature on the deposition of crystallised TixO2x-1 coatings Frédéric Lapostolle1, Yunfang Gui1, Alain Billard1 1LERMPS UTBM, Belfort, France |
| PO4033 |
The Effects of Varying Process Gas on the Growth of Thin Conducting Films Glen West1, Peter Kelly1 1Manchester Metropolitan University, Manchester, United Kingdom |
| PO4034 |
Effect of the deposition process and the substrate nature on the properties of sputtered lanthanum cuprate films Nolwenn Tranvouez1, Jean-Francois Pierson2, Fabien Capon2, Jean-Philippe Bauer2 1INPL/IJL, nancy, France, 2IJL, nancy, France |
| PO4035 |
Effect of substrate material on surface morphology of thin films prepared by nonreactive magnetron sputtering Pavel Baroch1, Tomas Kozak1, Jindrich Musil1 1University of West Bohemia, Department of Physics, Plzen, Czech Republic |
| PO4036 |
Gravitational approach of the structure of droplets in an arc evaporation PVD process: a telluric model Alexandre Mège-Revil1, Philippe Steyer2, Jean-François Pierson3 1Institut Jean Lamour, Nancy, France, 2INSA Lyon, laboratoire MATEIS-RI2S, Villeurbanne, France, 3Institut Jean Lamour - Ecole des Mines de Nancy - Département CP2S, Nancy, France |
| PO4037 |
Effects of dual arc source coatings on PVD process Kwang Soo Park1, Jong Won Park1, Kyung Hwang Lee1 1RIST, Ulsan, South Korea |
| PO4038 |
Plasma deposition effect on laser melted Ti coated substrate Catherine Cordier-Robert1 1Université de Lille1 - UMET, Villeneuve d'Ascq cedex, France |
Poster - Conductive and Catalytic Oxides |
|
| PO4039 |
Influence of Al concentration on structure and electrical properties of polycrystalline and epitaxial Al-doped ZnO films grown by reactive pulsed magnetron sputtering Steffen Cornelius1, Mykola Vinnichenko1, Andreas Kolitsch1, Wolfhard Möller1 1Forschungszentrum Dresden-Rossendorf, Dresden, Germany |
| PO4040 |
Comparative study of the optical an electrical performance of transparent conductive ZnO deposited by sol-gel and reactive magnetron sputtering Ramon Escobar Galindo1, Miriam Yuste1, Jose de Jesus Araiza2, Olga Sanchez1, Hugo Tototzintle2, Carlos Palacio3 1Instituto Ciencia Materiales Madrid, Madrid, Spain, 2Universidad Autonoma de Zacatecas, Zacatecas, Mexico, 3Universidad Autonoma de Madrid, Madrid, Spain |
| PO4041 |
Influence of the impinging angle and of the Aluminium content on the electrical resistivity of transparent ZnO coating elaborated by DC magnetron sputtering Pascal BRIOIS1, Alain BILLARD1 1LERMPS-UTBM, Belfort, France |
| PO4042 |
Pretreatment of glass substrates by low energy ion beam for as-sputtered textured zinc oxide thin films Wendi Zhang1, Eerke Bunte1, Astrid Besmehn2, Florian Ruske3, Dominik Köhl4, Janine Worbs1, Hilde Siekmann1, Jürgen Hüpkes1 1IEF-5, Forschungszentrum Jülich, Jülich, Germany, 2Zentralabteilung für Chemische Analysen, Forschungszentrum Jülich, Jülich, Germany, 3Institute Silicon Photovoltaics, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, Germany, 4I. Physikalisches Institut IA, Rheinisch-Westfaelische Technische Hochschule Aachen, Aachen, Germany |
| PO4043 |
1, , |
| PO4044 |
Improvement of Transparent Conductive Oxide films by low-temperature, atmospheric-pressure plasma annealing Hans Winands1, Mirjam Theelen1, Ariël de Graaf1, Joop van Deelen1, Paul Poodt1 1TNO Science and Industry, Eindhoven, Netherlands |
| PO4045 |
TiOx films as transparent self-cleaning oxidation protection coatings on metals Alessandro Patelli1, Simone Vezzu'1, Marino Colasuonno1, Lorenzo Zottarel1, Alessandro Martucci2, Stefano Costacurta1 1CIVEN, Marghera - Venezia, Italy, 2Universita' di Padova, Padova, Italy |
| PO4046 |
Effect of Spray Parameters on Photocatalytic Properties of Plasma Sprayed Nanostructured TiO2 Coating Maryamossadat Bozorgtabar1, Mohammadreza Rahimipour2, Mehdi Salehi3, Mohammadreza Jafarpour4 1Islamic Azad University, Majlesi Branch, Isfahan, Iran, 2Materials and Energy Research Center, Tehran, Iran, 3Department of Materials Eng., Isfahan University of Technology, Isfahan, Iran, 4Mobarakeh Steel Company, Isfahan, Iran |
| PO4047 |
Production of Photocatalytically Active Titania Layers
onto Textiles at Ambient Temperature Eva Maria Moser1, Sidney Chappuis1, Vincent Rivest1, Steve Röthlisberger1 1University of Applied Sciences of Geneva, Geneva, Switzerland |
| PO4048 |
Self- Cleaning and Anti- Microbial Transparent Photocatalytic Thin Films Prepared by Ion Assisted Deposition Redouan Boughaled1, Henrik Ehlers1, Detlev Ristau1, Michael Wark2 1Laser Zentrum Hannover e.V., Hannover, Germany, 2Institute of Physical Chemistry, Leibniz University Hannover, Hannover, Germany |
| PO4049 |
Plasma Deposited Yttria stabilized Zirconia thin films for solid oxide fuel cells Dimitrios Mataras1, Stelios Voyatzis1, Eleftherios Amanatides1, Dimitrios Mataras1 1University of Patras, Patras, Greece |
| PO4050 |
BaCe0.9-xZrxY0.1O3 thin film elaborated by reactive magnetron sputtering mohammad Arab Pour Yazdi1, Pascal Briois1, Alain Billard2 1LERMPS/UTBM, Belfort, France, 2LERMPS-UTBM, Belfort, France |
| PO4051 |
Structural investigations of novel catalysts for oxygen reduction reaction produced by a dual plasma process Christian Walter1, Volker Brüser1, Antje Quade1, Klaus-Dieter Weltmann1 1INP Greifswald, Greifswald, Germany |
| PO4052 |
TTHE EFFECT OF ANNEALING ON THE PROPERTIES OF ZnO:Al FILMS GROWN BY RF MAGNETRON SPUTTERING. Saâd Rahmane1, Djouadi Mohamed Abdou2, Aida Mohamed Salah3, Barreau Nicolas2 1Laboratoire de Chimie Appliquée, Biskra, Algeria, 2Institut des Matériaux Jean Rouxel IMN UMR 6502, Université de Nantes, Nantes, France, 3Laboratoire des Couches minces et Interfaces, Université Mentouri, Constantine, Algeria |
| PO4053 |
Pulsed Reactive DC magnetron sputtered Tantalum Oxide (Ta2O5) thin films: Photocatalytic properties Jagadeesh Kumar1, N Ravi Chandra Raju1, A Subrahmanyam1 1Indian Institute of Technology Madras, Chennai, India |
| PO4054 |
Optimization and up-scaling of hollow cathode gas flow sputter processes in the field of photocatalytic active coatings Jens Mahrholz1, Jens Mahrholz1, Denise Koeßler1, Sergey Shikolenko1, Kai Ortner1, Frank Neumann1, Tobias Graumann1, Markus Höfer1, Bernd Szyszka1 1Fraunhofer IST, Braunschweig, Germany |
| PO4055 |
Structure and photocatalytic properties of Ti1-xWxO2 sputtered thin films Grégory Abadias1, Aldo Gago-Rodriguez2, Nicolas Alonso-Vante2 1University of Poitiers, Chasseneuil-Futuroscope, France, 2LACCO, Université de Poitiers-CNRS, Poitiers, France |
| PO4056 |
Stability of TiO2 films modified by Ag and Pt nanoparticles Pavlina Hajkova1, Jindrich Matousek2, Ondrej Hedanek3 1Technical University of Liberec, Liberec, Czech Republic, 2J. E. Purkinje University, Department of Physics, Usti nad Labem, Czech Republic, 3Technical University of Liberec, Material Science, Liberec, Czech Republic |
Poster - Nanostructures and Nanoparticles |
|
| PO4057 |
Nanostructured surfaces via atmospheric pressure glow discharge Ian Coook1, David Sheel1, John Hodgkinson1 1University of Salford, Manchester, United Kingdom |
| PO4058 |
Deposition of nanostructures by chemical vapour deposition enhanced with an atmospheric pressure remote Ar-O2 plasma. Grégory ARNOULT1, Thierry BELMONTE2, Gérard HENRION2 1Institut Jean LAMOUR- CP2S-Team 201, nancy, France, 2Institut Jean Lamour - CP2S - team 201, nancy, France |
| PO4059 |
Deposition of superhydrophobic structures by magnetron discharge Stéphane Lucas1, Alexandre Felten1, JP Blondeau2, Fabrizio Maseri3, JJ Pireaux1, Valérie De Vriendt1 1University of Namur (FUNDP) - PMR, Namur, Belgium, 2Université d’Orléans - LESI, Chartres, Belgium, 3Arcelor Mittal Research & Development, Liège, Belgium |
| PO4060 |
Optimisation of PECVD parameters in order to obtain aluminium nitride nano-dots Zakaria BOUCHKOUR1, Christelle Dublanche-Tixier1, Cédric Jaoul1, Elsa Thune1, Alexandre Boulle1, René Guinebretière1, Pascal Tristant1 1Université de Limoges, CNRS, SPCTS, Limoges, France |
| PO4061 |
Analytical model for electrical resistivity of GLAD thin films Aurélien Besnard1, Nicolas Martin1 1Institut FEMTO-ST, Besançon, France |
| PO4062 |
Engineering and Characterization of Si Nano-Columns by Oblique Angle Deposition Levent Trabzon1, Sebahattin Guvendik1, Huseyin Kizil1 1Istanbul Technical University, Istanbul, Turkey |
| PO4063 |
On the role of supporting material and catalyst for growth of carbon nanotubes in microwave torch Lenka Zajickova1, Ondrej Jasek2, Petr Synek2, Marek Elias2, Vit Kudrle2, Jaroslav Hubalek3, Jan Prasek3, Renata Hanzlikova4, Nadezda Pizurova5 1Masaryk University, Brno, Czech Republic, 2Dept Phys Electronics, Masaryk University, Brno, Czech Republic, 3Dept Microelectronics, Brno University of Technology, Brno, Czech Republic, 4Inst Sci Instruments, Academy of Science of the Czech Republic, Brno, Czech Republic, 5Inst Phys Mater, Academy of Sciences of the Czech Republic, Brno, Czech Republic |
| PO4064 |
Growth and plasma surface modifications of vertically aligned carbon nanotube forests
Jean-François Colomer1, Moreau Nicolas2, Thomas Godfroid3, Rony Snyders3, Carla Bittencourt3, Jean Pol Vigneron2, Stephane Lucas2 1University of Namur (FUNDP) - PMR, Namur, Belgium, 2University of Namur (FUNDP) - PMR, Namur, Belgium, 3Materia Nova - University of Mons, Mons, Belgium |
| PO4065 |
Surface modification of Multi Wall Carbon Nanotubes by a hollow cathode discharge. Christophe Rigaux1, Stephane Lucas2 1Nanocyl R&D Department CNT Group, Sambreville, Belgium, 2University of Namur (FUNDP) – PMR, Namur, Belgium |
| PO4066 |
Carbon nanotube functionalization with a cold
atmospheric pressure plasma jet and post-plasma reactions
Daniel Kolacyak1, Jörg Ihde1, Uwe Lommatzsch1 1Fraunhofer Institute, Bremen, Germany |
| PO4067 |
Functionalization of CNT arrays and ribbons by atmospheric pressure plasma David DUDAY1, Rémy MAURAU1, Nicolas BOSCHER1, Jérôme GUILLOT1, Gilles FRACHE1, Patrick CHOQUET1, Jean Christophe LAMBRECHTS1, Mark SCHULZ2, Vesselin SHANOV2 1CRP Gabriel Lippmann, BELVAUX, Luxembourg, 2University of Cincinnati, Cincinnatti, United States |
| PO4068 |
Synthesis and characterization of carbon nanowalls layers with metallic nanoparticles inclusions Sorin Vizireanu1, Silviu Daniel Stoica2, Bogdana Mitu2, Catalin Romeo Luculescu2, Gheorghe Dinescu2 1NILPRP, Bucharest/Magurele, Romania, 2National Institute for Laser, Plasma and Radiation Physics, Magurele, Romania |
| PO4069 |
TiO2 Coatings with Au Nanoparticles Analyzed by Photothermal Methods Francisco Macedo1, Filipe Vaz2, Roberto Faria Jr.2, Marc Torrell2, Albano Cavaleiro3, Klaus Junge4, Bruno Bein4 1Universidade do Minho, Braga, Portugal, 2Universidade do Minho, Centro de Física, Campus de Gualtar, Braga, Portugal, 3SEC-CEMUC – Universidade de Coimbra, Eng. Mecânica, Polo II, Coimbra, Portugal, 4Solid State Spectroscopy, Physics & Astronomy, Ruhr-University, Bochum, Germany |
| PO4070 |
Plasma functionalization of multi-scale structured surfaces to control the formation of ice crystals Michael Haupt1, Stefan Jung2, Volker Weiss3, Markus Rullich3, Christof Koehler3, Thomas Frauenheim3, Hannelore Benien2, Franz Gammel2, Heinz Hilgers4, Christian Oehr1 1Fraunhofer IGB, Stuttgart, Germany, 2EADS Innovation Works, Munich, Germany, 3Bremen Center for Computational Materials Science, Bremen, Germany, 4Cerobear GmBH, Herzogenrath, Germany |
| PO4071 |
1, , |
| PO4072 |
Particle agglomeration in dusty plasmas, numerical modeling and experiments Simon DAP1, David LACROIX2, Robert HUGON1, Fabrice PATISSON3, Frédéric BROCHARD1, Ludovic de POUCQUES1, Jamal BOUGDIRA1 1IJL, Faculté des sciences et Techniques, Vandoeuvre les Nancy cedex, France, 2LEMTA, Faculté des Sciences et Techniques, BP 70239, Vandoeuvre les Nancy cedex, France, 3IJL, Ecole des Mines - CS 14234, Nancy cedex, France |
| PO4073 |
In-situ diagnostics during nano-particle generation in process plasmas Holger Kersten1, Morten Hundt2, Patrick Sadler2, Matthias Wolter2 1Universiity of Kiel, IEAP, Kiel, Germany, 2University of Kiel, IEAP, Kiel, Germany |
| PO4074 |
Gas aggregation nanocluster source - reactive depositions of copper and titanium nanoclusters Ales Marek1, Jan Valter1, Stanislav Kadlec1, Jiri Vyskocil1 1HVM Plasma, spol. s r.o., Prague, Czech Republic |
| PO4075 |
1, , |
| PO4076 |
Self-assembled Ag nanoparticles on ion sputtered GaSb dot pattern MUKESH RANJAN1, Jing Zhou1, Monika Fritzsche1, Stefan Facsko1, Wolfhard Möller1 1Forschungszentrum Dresden-Rossendorf, Dresden, Germany |
Poster - Mechanical Film Properties |
|
| PO4077 |
Modeling of Residual Stresses in TBC Coated Gas Turbine Blades IMDAT TAYMAZ1, Yasar Kahraman2, Fatih Ustel3, Kemal Cakir2 1SAKARYA UNIVERSITY, MECHANICAL ENG. DEPT, SAKARYA-ADAPAZARI, Turkey, 2Sakarya University, Sakarya-Adapazari, Turkey, 3Sakarya University,Metallurgical Eng. Dept., Sakarya-Adapazari, Turkey |
| PO4078 |
1, , |
| PO4079 |
Investigation of the application of plasticity size effects for practical tribological advantage. Nigel Jennett1, Xiaodong Hou1 1National Physical Laboratory, Teddington, United Kingdom |
| PO4080 |
Evaluation of Mechanical Properties of DLC Layers using the Resonant Ultrasound Spectroscopy and AFM tip Tomas Kocourek1, Michal Ruzek2, Michal Landa2, Miroslav Jelinek1, Jan Remsa1 1Institute of Physics AS CR, Praha, Czech Republic, 2Institute of Thermomechanics AS CR, Praha, Czech Republic |
| PO4081 |
Mechanical properties and fatigue behavior of Co-depleted WC-Co surface prepared for diamond coating depsition Shoji Kamiya1, Shoji Kamiya1, Hiroyuki Hanyu2 1Nagoya Institute of Technology, Nagoya, Japan, 2OSG Corporation, Toyokawa, Japan |
| PO4082 |
1, , |
| PO4083 |
Correcting time dependent displacements effects in nanoindentation analysis Norbert Schwarzer1, Michael Davies2, Nicola Everitt2, Ben Beake3 1Saxonian Institute of Surface Mechanics, Ummanz / Rügen, Germany, 2University of Nottingham, Nottingham, United Kingdom, 3Micro Materials Ltd., Wrexham, United Kingdom |
| PO4084 |
Advanced scratch test methods in combination with elastic stress calculations - a new tool for the failure analysis of coatings Thomas Chudoba1, Norbert Schwarzer2 1ASMEC GmbH, Radeberg OT Rossendeorf, Germany, 2Sächsisches Institut für Oberflächenmechanik, Ummanz, Germany |
| PO4085 |
Instrumentational developments in triboanalysis of PVD coatings Alexander Minewitsch1, Maxim Krasnensky1 1TTZH GmbH, Garbsen, Germany |
| PO4086 |
ON MEASUREMENT UNIFORMITY AT CHARACTERIZATION OF MECHANICAL AND TRIBOLOGICAL PROPERTIES OF NANOSTRUCTURED FILMS Mikhail Petrzhik1, Marina Tyurina1, Nina Kozlova1, Eugeny Levashov1 1"MISiS", Moscow, Russian Federation |
| PO4087 |
Influence of substrate hardness on deformation mechanisms in TiN plastically deformed by nanoindentation analyzed by TEM Magdalena Parlinska-Wojtan1, Dominik Jaeger2, Michael Stiefel3, Kilian Wasmer4, Joerg Patscheider2 1Center of Electron Microscopy, Empa, Duebenedorf, Switzerland, 2Nanoscale Materials Science, Empa, Duebendorf, Switzerland, 3Electronics/Metrology/Reliability Laboratory, Empa, Duebendorf, Switzerland, 4Advanced Materials Processing, Empa, Thun, Switzerland |
| PO4088 |
Innovative Method for examinating multiple thin film properties.
Wolfgang P. Weinhold1, Andreas M. Zoll1 1Innowep GmbH, Würzburg, Germany |
| PO4089 |
Depth profile of mechanical properties for plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation Rutul Trivedi1, L. Hoferek1, V. Cech1 1Brno University of Technology, Brno, Czech Republic |
| PO4090 |
Mechanical Surface Stability and Reliability under High Temperature Fields Nick Bierwisch1, Norbert Schwarzer1, Torsten Kirst 1SIO, Nordhausen, Germany |
| PO4091 |
Crack resistance of hard coatings Manfred Schlögl1, Florian Rovere1, Paul H. Mayrhofer1 1Montanuniversität Leoben, Leoben, Austria |
Poster - Plasma Modelling and Simulation |
|
| PO4092 |
Kinetic modelling of plasma enhanced chemical vapour deposition (PECVD) of BN-films Achim Lunk1, Jens Matheis2, Yating Wu3 1Institut for Plasma Research/TGZ PA, Stuttgart, Germany, 2Institute for Plasma Research, Stuttgart, Germany, 3State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, Shanghai, China |
| PO4093 |
Electron Monte Carlo model for a dual magnetron discharge, used for the sputter deposition of complex oxide layers Maksudbek Yusupov1, Evi Bultinck1, Diederik Depla2, Annemie Bogaerts1 1Research Group PLASMANT, Antwerp, Belgium, 2Department of Solid State Sciences, Ghent, Belgium |
| PO4094 |
Particle-in-cell simulation of a magnetized sheet plasma using a magnetron
for sputtering enhancement Henry ,Jr. Lee1, Leo Mendel Rosario2, Rommel Paulo Viloan3, Michelle Villamayor3, Roy Tumlos4, Henry Ramos3 1National Institute of Physics,, Metro Manila, Philippines, 2College of Arts, Science and Education, FEATI University, Manila, 1003, Philippines, 3National Institute of Physics, University of the Philippines, Quezon City, 1101, Philippines, 4Department of Science and Mathematics, University of the Philippines, Manila, 1000, Philippines |
| PO4095 |
Fluid modelling of the DC magnetron plasma under low pressure conditions Lise Caillault1, Manivannane Pourouchottamane2, Tiberiu Minea1 1LPGP UMR 8578, Orsay, France, 2Saint-Gobain-Recherche, 39, quai Lucien-Lefranc BP 135, Aubervilliers, France |
| PO4096 |
Fixing the parameter set for reactive sputtering modelling Koen Strijckmans1, Wouter Leroy2, Annemie Bogaerts3, Diederik Depla2 1UGent Dept. of Solid State Sciences, Gent, Belgium, 2Dept. of Solid State Sciences, Ghent University, Ghent, Belgium, 3Dept. of Chemistry, University of Antwerp, Antwerp, Belgium |
| PO4097 |
Material Processing in Chemically Active Plasmas Stanislav Novak1, Pavel Cerny1, Rudolf Hrach1, Vera Hrachova2 1J. E. Purkinje University, Usti nad Labem, Czech Republic, 2Charles University, Prague 8, Czech Republic |
| PO4098 |
Detailed study of plasma-substrate interaction in plasma-assisted technologies Rudolf Hrach1, Vojtech Hruby2, Vera Hrachova2 1Charles Univ., Fac. Mathem. and Physics, Prague 8, Czech Republic, 2Charles University, Faculty of Mathematics and Physics, Prague 8, Czech Republic |
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Interaction of low-temperature plasma with fabric: study by computer simulations Petr Bartos1, Petr Spatenka1, Michal Pekarek1 1University of South Bohemia, Ceske Budejovice, Czech Republic |
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| PO4101 | 1, , |
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